GIGASPIN88 NO FURTHER A MYSTERY

q to manage “EUV” masks and “EUV” reticles designed for integrated circuits, not specified by 3B001.g, and possessing a mask “substrate blank” specified by 3B001.j.” A complex Notice is additional to clarify that masks or reticles with a mounted pellicle are deemed masks and reticles. BIS is revising paragraph (d) to revise the clari